描述
This product is a custom-engineered silicon carbide (SiC) ceramic disc featuring an integrated stepped profile. It is designed for use in harsh industrial environments where high temperature stability, chemical resistance, and mechanical reliability are essential.
Unlike polished or optical-grade components, this SiC part is supplied with a functional, ground surface finish. The design focuses on structural performance, accurate positioning, and long-term durability rather than surface aesthetics, making it well suited for internal components of semiconductor processing and thermal equipment.
Design Characteristics
Circular disc geometry with precision-machined step
Optimized for axial positioning and secure installation
Functional ground surface, no optical polishing required
High dimensional consistency across thermal cycles
Edge features configurable to match mating components
Material Advantages
Silicon carbide ceramics are widely used in semiconductor and advanced processing equipment due to their combination of mechanical strength and chemical stability. This stepped disc leverages those advantages to provide reliable performance under demanding operating conditions, including exposure to plasma, reactive gases, and elevated temperatures.
Typical Technical Data
| Artikel | Typischer Wert |
|---|---|
| Material Type | Siliziumkarbid (SiC) |
| Purity Level | ≥ 99% |
| Bulk Density | 3.10 – 3.20 g/cm³ |
| Vickers Hardness | ≥ 2500 HV |
| Bending Strength | ≥ 350 MPa |
| Young’s Modulus | ~410 GPa |
| Wärmeleitfähigkeit | 120 – 200 W/m·K |
| Thermal Expansion (CTE) | ~4.0 × 10⁻⁶ /K |
| Max Operating Temp. (Inert) | > 1600°C |
| Max Operating Temp. (Air) | ~1400°C |
| Surface Condition | Ground / Unpolished |
| Electrical Behavior | Insulating grade available |
| Vacuum Compatibility | Ausgezeichnet |
Specifications may vary depending on design and processing requirements.
Application Areas
Semiconductor processing chamber components
Equipment covers and protective ceramic plates
Structural or support elements in high-temperature systems
Plasma-adjacent ceramic parts
Vacuum process equipment and thermal reactors
Customized ceramic components for advanced manufacturing tools
Anpassungsoptionen
Diameter and thickness tailored to application
Step height, width, and position configurable
Optional fine grinding or polishing upon request
Production based on technical drawings or samples
Support for prototyping and small-batch manufacturing
FAQ
Q1: What role does the stepped structure serve?
The step is used for positioning, alignment, or load distribution when the component is installed inside equipment. It helps ensure consistent placement and reliable mechanical support.
Q2: Is a polished surface required for this product?
No. This component is designed for functional use inside equipment, where polishing is not necessary. The ground surface provides sufficient performance for structural and thermal applications.
Q3: Can the part withstand plasma exposure?
Yes. Silicon carbide exhibits strong resistance to plasma erosion and chemical attack, making it suitable for plasma-rich semiconductor environments.
Q4: Is this component suitable for vacuum operation?
Yes. The material properties and manufacturing process make it compatible with vacuum systems, including low outgassing and stable mechanical behavior.
Q5: Are custom dimensions supported?
Yes. The component can be fully customized based on customer drawings, including overall size, step geometry, and edge features.
Zusammenfassung
This custom SiC ceramic stepped disc is a robust and reliable solution for semiconductor and high-temperature industrial equipment. Its functional surface finish, precise geometry, and excellent material properties make it ideal for structural and protective applications in demanding process environments.
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