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This document presents an overview of our 4-inch silicon carbide (SiC) wafers, specifically designed for high-performance applications in power electronics and optoelectronics. Available in both N-Type and semi-insulating variants, these 4H-SiC substrates exhibit superior electrical properties, thermal conductivity, and chemical stability, making them ideal for demanding environments.

Silicon carbide is recognized for its ability to operate at high voltages, temperatures, and frequencies, positioning it as a critical material for next-generation devices such as power transistors, diodes, and high-frequency RF devices. Our Silicon Carbide wafers feature excellent surface quality, low defect density, and uniform thickness, ensuring optimal performance in semiconductor fabrication processes.

With their robust characteristics, our Silicon Carbide wafers are poised to meet the increasing demands of various industries, including automotive, telecommunications, and renewable energy. This paper will delve into the specifications, benefits, and applications of these silicon carbide substrates, highlighting their role in advancing technological innovation and efficiency in modern electronic systems.

4 inch Silicon Carbide wafer (SiC) Crystal Substrate, SiC Wafers Specifications

ParametriNolla MPD-luokkaTuotantoluokkaTutkimusasteDummy-luokka
Halkaisija100.0 mm +/- 0.5 mm100.0 mm +/- 0.5 mm100.0 mm +/- 0.5 mm100.0 mm +/- 0.5 mm
Paksuus500 um +/- 25 um (semi-insulating)350 um +/- 25 um (N type)500 um +/- 25 um (semi-insulating)350 um +/- 25 um (N type)
Kiekon suuntausOn axis: <0001> +/- 0.5 deg for 4H-SIOn axis: <0001> +/- 0.5 deg for 4H-SIOn axis: <0001> +/- 0.5 deg for 4H-SIOn axis: <0001> +/- 0.5 deg for 4H-SI
Off axis: 4.0 deg toward <11-20> +/-0.5 deg for 4H-NOff axis: 4.0 deg toward <11-20> +/-0.5 deg for 4H-NOff axis: 4.0 deg toward <11-20> +/-0.5 deg for 4H-NOff axis: 4.0 deg toward <11-20> +/-0.5 deg for 4H-N
Micropipe Density (MPD)1 cm⁻²5 cm⁻²15 cm⁻²30 cm⁻²
Electrical Resistivity (Ohm-cm)4H-N: 0.015~0.0284H-N: 0.015~0.0284H-N: 0.015~0.0284H-N: 0.015~0.028
4H-SI: >1E54H-SI: >1E54H-SI: >1E54H-SI: >1E5
Doping ConcentrationN-type: ~ 1E18/cm³N-type: ~ 1E18/cm³N-type: ~ 1E18/cm³N-type: ~ 1E18/cm³
SI-type (V-doped): ~ 5E18/cm³SI-type (V-doped): ~ 5E18/cm³SI-type (V-doped): ~ 5E18/cm³SI-type (V-doped): ~ 5E18/cm³
Ensisijainen asunto{10-10} +/- 5.0 deg{10-10} +/- 5.0 deg{10-10} +/- 5.0 deg{10-10} +/- 5.0 deg
Ensisijainen litteä pituus32.5 mm +/- 2.0 mm32.5 mm +/- 2.0 mm32.5 mm +/- 2.0 mm32.5 mm +/- 2.0 mm
Toissijainen tasainen pituus18.0 mm +/- 2.0 mm18.0 mm +/- 2.0 mm18.0 mm +/- 2.0 mm18.0 mm +/- 2.0 mm
Toissijainen tasainen suuntausSilicon face up: 90 deg CW from Primary flat +/- 5.0 degSilicon face up: 90 deg CW from Primary flat +/- 5.0 degSilicon face up: 90 deg CW from Primary flat +/- 5.0 degSilicon face up: 90 deg CW from Primary flat +/- 5.0 deg
Edge Exclusion3 mm3 mm3 mm3 mm
LTV/TTV /Bow /Warp10 um / 15 um / 25 um / 40 um10 um / 15 um / 25 um / 40 um10 um / 15 um / 25 um / 40 um10 um / 15 um / 25 um / 40 um
Pinnan karheusOptical Polish Ra < 1 nm on the C faceOptical Polish Ra < 1 nm on the C faceOptical Polish Ra < 1 nm on the C faceOptical Polish Ra < 1 nm on the C face
CMP Ra < 0.5 nm on the Si faceCMP Ra < 0.5 nm on the Si faceCMP Ra < 0.5 nm on the Si faceCMP Ra < 0.5 nm on the Si face
Cracks Inspected by High Intensity LightEi oleEi ole1 allowed, 1 mm1 allowed, 2 mm
Hex Plates Inspected by High Intensity LightCumulative area 1%Cumulative area 1%Cumulative area 1%Cumulative area 3%
Polytype Areas Inspected by High Intensity LightEi oleEi oleCumulative area 2%Cumulative area 5%
Scratches Inspected by High Intensity Light3 scratches to 1 x wafer diameter cumulative length3 scratches to 1 x wafer diameter cumulative length5 scratches to 1 x wafer diameter cumulative length5 scratches to 1 x wafer diameter cumulative length
Edge ChippingEi oleEi ole3 allowed, 0.5 mm each5 allowed, 1 mm each
Surface Contamination as Inspected by High Intensity LightEi oleEi oleEi oleEi ole

4 inch Silicon Carbide wafer (SiC) Crystal Substrate PROPERTIES OF SILICON CARBIDE CRYSTAL MATERIALS

Kiinteistö4H-SiC Single Crystal6H-SiC Single Crystal
Lattice Parameters (Å)a = 3.076, c = 10.053a = 3.073, c = 15.117
Stacking SequenceABCBABCACB
Tiheys3.213.21
Mohs Hardness~9.2~9.2
Thermal Expansion Coefficient (CTE) (/K)4-5 x 10⁻⁶4-5 x 10⁻⁶
Refraction Index @ 750nmno = 2.61, ne = 2.66no = 2.60, ne = 2.65
Dielektrinen vakioc ~ 9.66c ~ 9.66
Doping TypeN-type or Semi-insulatingN-type or Semi-insulating
Thermal Conductivity (W/cm-K @ 298K)(N-type, 0.02 ohm-cm) a ~ 4.2, c ~ 3.7a ~ 4.6, c ~ 3.2
Thermal Conductivity (W/cm-K @ 298K)(Semi-insulating type) a ~ 4.9, c ~ 3.9
Band-gap (eV)3.233.02
Break-Down Electrical Field (V/cm)3-5 x 10⁶3-5 x 10⁶
Saturation Drift Velocity (m/s)2.0 x 10⁵2.0 x 10⁵
Wafer and Substrate SizesWafers: 2, 4, 6, 8 inch; smaller substrates: 10×10, 20×20 mm, other sizes available upon request
Product GradesA Grade: Zero micropipe density (MPD 1 cm⁻²)
B Grade: Production grade (MPD 5 cm⁻²)
C Grade: Research grade (MPD 15 cm⁻²)
D Grade: Dummy grade (MPD 30 cm⁻²)

4 inch Silicon Carbide wafer’s photo

4 tuuman piikarbidikiekko
4 tuuman piikarbidikiekko

4 inch Silicon Carbide wafer’s application

Here’s a more extensive overview of applications for 4-inch Silicon Carbide (SiC) wafers, along with additional details for each category:

1. Tehoelektroniikka

2. High-Temperature Applications

3. RF and Microwave Devices

4. LEDs and Photovoltaics

5. Electric Vehicles (EVs)

6. Industrial Automation

7. Renewable Energy Systems

8. Medical Devices

9. Telecommunications

10. Consumer Electronics

11. Automotive Applications

12. Electric Grid Management

13. Smart Manufacturing

14. Testing and Measurement

These applications demonstrate the versatility and wide-ranging impact of 4-inch SiC wafers across multiple industries, driving advancements in efficiency, performance, and sustainability. If you need further details on any specific application or technology, feel free to ask!

4 inch Silicon Carbide wafer’s properties

Silicon Carbide (SiC) wafers possess a range of unique properties that make them highly suitable for various advanced applications, particularly in power electronics and high-temperature environments. Here are some key properties of SiC wafers:

1. Wide Bandgap

2. Korkea lämmönjohtavuus

3. Korkea hajoamissähkökenttä

4. Korkea mekaaninen lujuus

5. Excellent Chemical Stability

6. Low Thermal Expansion Coefficient

7. High Saturation Drift Velocity

8. Doping Capability

9. Pinnan karheus

10. Resistiivisyys

11. Lattice Structure

12. Dielektrinen vakio

13. Optiset ominaisuudet

14. Mikroputken tiheys

These properties make Silicon Carbide wafers highly desirable for advanced electronics, particularly in high-power, high-temperature, and high-frequency applications. If you need specific information or further details on any property, feel free to ask!

4 inch Silicon Carbide wafer’s Q&A

What is a silicon carbide wafer used for?

Silicon carbide (SiC) wafers are increasingly used in various high-performance applications due to their unique properties, such as a wide bandgap, high thermal conductivity, and excellent mechanical strength. Here are some of the primary applications of silicon carbide wafers:

1. Tehoelektroniikka

2. High-Temperature Applications

3. RF and Microwave Devices

4. LEDs and Optoelectronics

5. Electric Vehicles (EVs)

6. Telecommunications

7. Industrial Equipment

8. High-Power Lasers

9. Sensor Applications

10. Durable Substrates

11. Photovoltaics

12. Research and Development

13. Silicon Carbide Fiber Reinforcement

Silicon carbide wafers are a key enabler in the transition toward more efficient, high-performance electronic systems, particularly in the context of emerging technologies like electric vehicles and renewable energy. If you need more information about any specific application, let me know!

What is the difference between silicon and SiC?

Silicon (Si) and silicon carbide (SiC) are both important materials in the semiconductor industry, but they have distinct properties and applications. Here are the key differences between the two:

1. Kiderakenne

2. Bandgap

3. Lämmönjohtavuus

4. Sähköiset ominaisuudet

5. Doping Characteristics

6. Sovellukset

7. Kustannukset

8. Mekaaniset ominaisuudet

9. Lämpölaajenemiskerroin

Yhteenveto

In summary, while silicon is the traditional material for semiconductor devices, silicon carbide offers significant advantages for high-performance applications, particularly in power electronics and environments where higher temperatures and voltages are required. The choice between the two materials depends on the specific requirements of the application. If you have any more questions or need further details, feel free to ask!

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